Literature: Thermoelectric materials and devices
Heavily Boron-Doped Silicon Layer for the Fabrication of Nanoscale Thermoelectric Devices
Metadata from OpenAlex, exported on 9 September 2026. It is the provider's report, not verified here.
What the provider reports
- Authors
- Zhe Ma, Yang Liu, Lingxiao Deng, Mingliang Zhang, Shuyuan Zhang, Jing Ma, Peishuai Song, Qing Liu, An Ji, Fuhua Yang, Xiaodong Wang
- Published
- 30 January 2018
- Venue
- Nanomaterials
- DOI
- 10.3390/nano8020077
- OpenAlex id
- W2790199302
- Primary topic, as reported
- Advanced Thermoelectric Materials and Devices (T10440)
- Access, as reported
- Open access: gold; licence cc-by. Reported access is not verified reuse permission.
- Retraction, as reported
- Not reported retracted
- Landing page
- https://doi.org/10.3390/nano8020077
- PDF link, as reported
- https://www.mdpi.com/2079-4991/8/2/77/pdf?version=1517329932 (a link the provider reported, not an acquired source)
- In this collection because
- it matched the collection rule at export
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